Betekenis van:
ion beam

Werkwoord

Voorbeeldzinnen

1. Negative ion beam funnelling equipment;
2. i. Negative ion beam funnelling equipment;
3. using deflected focussed electron beam, ion beam or "laser" beam; and
4. Using deflected focussed electron beam, ion beam or "laser" beam; and
5. Equipment for controlling and slewing a high energy ion beam;
6. "Stored programme controlled" ion implantation production equipment having beam currents of 5 mA or more;
7. "Energetic particle beam finishing" uses Reactive Atom Plasmas (RAP) or ion-beams to selectively remove material.
8. Ion implantation production equipment having beam currents of 5 mA or more;
9. ’Energetic particle beam finishing’ uses Reactive Atom Plasmas (RAP) or ion-beams to selectively remove material.
10. Equipment specially designed for mask making or semiconductor device processing using deflected focussed electron beam, ion beam or "laser" beam, having any of the following:
11. 1B226 Electromagnetic isotope separators designed for, or equipped with, single or multiple ion sources capable of providing a total ion beam current of 50 mA or greater.
12. Electromagnetic isotope separators designed for, or equipped with, single or multiple ion sources capable of providing a total ion beam current of 50 mA or greater.
13. Ion Assisted Resistive Heating PVD employs electrically resistive heating sources in combination with impinging ion beam(s) to produce a controlled and uniform flux of evaporated coating species;
14. Ion sources, single or multiple, consisting of a vapour source, ioniser, and beam accelerator made of suitable non-magnetic materials (e.g. graphite, stainless steel, or copper) and capable of providing a total ion beam current of 50 mA or greater;
15. This includes processes in which ion implantation is performed simultaneously with electron beam physical vapour deposition or sputter deposition.